Project information
Study of hybrid deposition process and its application for thin film deposition
- Project Identification
- GP202/08/P038
- Project Period
- 1/2008 - 12/2010
- Investor / Pogramme / Project type
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Czech Science Foundation
- Postdoctoral projects
- MU Faculty or unit
- Faculty of Science
- Keywords
- magnetron sputtering, hybrid PVD-PECVD, hysteresis behaviour, thin film deposition, nanocomposite, BCN
This project focuses on investigation of behaviour of hybrid PVD-PECVD process, which will be used for preparation of nanocomposite n-Ti:C/a-C:H and a-BCN:H materials. In this hybrid deposition process, a gaseous hydrocarbon will be used as a source of carbon instead of its conventional sputtering from magnetron target. Hysteresis behaviour of this process together with properties of deposited thin films will be investigated and compared with those of PVD process. Comparative study for two types of hydrocarbons will be performed. Advanced model of reactive sputtering assuming nonuniform discharge current density will be developed. This model will be extended to accommodate the interaction of gaseous hydrocarbon with all surfaces in the deposition chamber.
Publications
Total number of publications: 37
2010
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Diagnostics of reactive magnetron sputtering
Year: 2010, type:
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Higher harmonic frequencies in capacitive discharges
Bulletin of the American Physical Society 55 (2010), CTP142, year: 2010
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Higher harmonic frequencies in capacitive discharges
63rd GEC and 7th ICRP - Conference Proceedings, year: 2010
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Hybrid PVD-PECVD process: focusing on modelling and steady-state conditions
Year: 2010, type: Conference abstract
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Impact of neutral gas temperatures on reactive magnetron sputtering
Potential and Applications of Thin Ceramic and Metal Coatings, year: 2010
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Monitoring of magnetron target poisoning by measurement of higher harmonics of discharge voltages
Plasma Sources Sci. Technol., year: 2010, volume: 19, edition: 5
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Monitoring of PVD, PECVD and etching plasmas using Fourier components of RF voltage
Plasma Physics and Controlled Fusion, year: 2010, volume: 52, edition: 12, DOI
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Preparation of self-adhesive nc-TiC/a-C:H coatings
Potential and Applications of Thin Ceramic and Metal Coatings, year: 2010
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Suppressed hysteresis behaviour of Ti sputtering in acetylene gas
Year: 2010, type: Conference abstract
2009
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Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process
Europhysics Letters, year: 2009, volume: 85, edition: 1