Effect of plasma treatment on the surface morphology and wettability of (111) and (100) silicon wafers

Warning

This publication doesn't include Faculty of Medicine. It includes Faculty of Science. Official publication website can be found on muni.cz.
Authors

SKÁCELOVÁ Dana HANIČINEC Martin SŤAHEL Pavel ČERNÁK Mirko

Year of publication 2011
Type Conference abstract
MU Faculty or unit

Faculty of Science

Citation
Description This paper is focused on the plasma treatment of silicon surface. The effect of plasma treatment in dependence of the different crystallographic orientation of silicon surface,(100) plane and (111) plane is compare
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.

More info