Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge
| Authors | |
|---|---|
| Year of publication | 2008 |
| Type | Article in Periodical |
| Magazine / Source | Chem. listy |
| MU Faculty or unit | |
| Citation | |
| Web | http://www.chemicke-listy.cz/docs/full/2008_16_s1529-s1532.pdf |
| Field | Plasma physics |
| Keywords | plasma enhanced chemical vapor deposition;pulsed discharge;atomic force microscopy |
| Description | We studied in this work surface morphology of thin amorphous hydrocarbon films by means of atomic force microscope. The AFM data were collected in two regions on the sample. We observed a significant difference in roughness parameters between these regions with increasing total deposition time. RMS values of the heights near the edge of the sample did not exhibit any significant change with the total deposition time and in the mean are equal to approximately 7 nm. However, RMS values of the heights in the center of the sample increased linearly with the total deposition time and reached values up to 125.6 nm. The values of autocorrelation length were independent on total deposition time, but there was a difference in absolute values. The mean value of this parameter near the edge of the sample was 145 nm, while in the center of the sample the respective value was 359 nm. The suggested reason for this surface non-uniformity is the reactor design. |
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